Senior​/Lead Research Engineer; APM​/Lithography), IME

Senior/Lead Research Engineer (APM/Lithography), IME

Join to apply for the Senior/Lead Research Engineer (APM/Lithography), IME role at A STAR - Agency for Science, Technology and Research
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1 week ago – Be among the first 25 applicants.

• Lead the central lithography team under the Pattern Transfer group.
• Selection, procurement and qualification of litho tool sets ranging from contact aligner to immersion.
• Actively work with cross‑functional stakeholders to plan and develop new lithography processes.
• Validate design, reticle tap‑out and post‑tap‑out verification.
• Assist in internal and external technical discussions to overcome process‑related challenges and provide relevant solutions.
• Perform process characterization and margin studies to determine the capability of new process platforms.
• Serve as a subject‑matter expert and resource for researchers and industry partners to enable process and/or product realization.
• Publish process development outcomes and breakthroughs in the research community.
• Engage with relevant equipment makers/vendors and be responsible for selecting and procuring research equipment.
• Work with the fab team to establish SPC for newly developed processes.

• Ph.D., Master’s or Bachelor’s degree in Materials Science, Electrical Engineering, Chemical Engineering, Physics, Chemistry, Microelectronics or closely related fields.
• More than 10 years of relevant R&D and/or industry experience with broad exposure in handling 6‑inch, 8‑inch and/or 12‑inch substrates covering nano‑ to micron‑tech nodes; experience in SiC, GaN, Photonics preferred.
• Proficient in photolithography tools including immersion, KrF, i‑line scanner/stepper/mask aligner; knowledge of e‑beam lithography tools is an advantage.
• Hands‑on experience in metrology (CDSEM, Overlay, OCD, DRSEM, Microscope) and capable of creating recipes to support various research requirements.
• Knowledge in design and simulation (Prolith, OPC, etc.), reticle layout (oas, gds) review and basic tap‑out process.
• Equipped with lithography skills set including fundamental theory, photoresist characteristics and application, new process setup (swing curve, FEM, DOE, statistical root‑cause analysis and problem‑solving methods) and optimization/margin improvement techniques.
• Relevant hardware and application knowledge of lithography tools and metrology.
• Good interpersonal and oral/written communication skills, with ability to deliver clear and concise messages to both internal and external stakeholders.

Mid‑Senior level

Full‑time

Engineering and Information Technology

Research Services

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