Senior Photolithography Scanner Metrology Engineer

Micron’s Boise site is a cornerstone of the company’s historic investment in leading-edge semiconductor manufacturing. The Boise expansion team is building advanced DRAM capabilities that will enable future technology innovation and long‑term growth, supported by strong collaboration across process, equipment, and integration engineering organizations.

The Senior Photolithography Scanner Metrology Engineer develops, implements, and optimizes advanced metrology solutions to enable world‑class lithography performance. This role focuses on overlay measurement, alignment accuracy, and scanner–metrology interaction to ensure precise pattern placement critical to advanced DRAM manufacturing.

• Develop, optimize, and sustain scanner metrology solutions supporting advanced photolithography processes
• Drive improvements in overlay performance, alignment accuracy, and process control using data‑driven analysis
• Utilize KLA metrology systems and diffraction‑based overlay techniques to monitor and improve lithography performance
• Partner with process, equipment, and integration teams to troubleshoot and resolve overlay and alignment issues
• Perform root cause analysis on overlay errors, tool matching challenges, and process variability while improving SPC metrics

• 5+ years of semiconductor industry experience focused on scanner metrology, overlay, or lithography metrology systems
• Hands‑on experience with KLA metrology tools and overlay measurement techniques, including diffraction‑based overlay
• Strong understanding of alignment and overlay fundamentals in advanced photolithography
• Experience troubleshooting overlay or metrology issues in a fab or manufacturing environment
• Bachelor’s or Master’s degree in Engineering or a related technical field, equivalent military experience, or an AAS with 5+ years of relevant experience
• Willingness to travel internationally for onboarding and training