Photomask Wet Process Intern: Data-Driven Cleaning
Listed on 2026-11-02
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Engineering
Micron Technology, Inc. in Boise, Idaho, invites motivated students to join the Mask Technology Center as a Photomask Wet Process Engineering Intern. You will work on EUV and DUV photomask cleaning and resist-strip processes, contributing to defect reduction, process characterization and data-driven development.
You will design experiments, analyze yield data, and present results to engineering teams. This paid internship offers mentorship, hands-on projects, and exposure to leading
This opening is for the Photomask Wet Process Intern:
Data-Driven Cleaning role at Micron Technology, Inc.
This opportunity is part of our work in Engineering.
The advertised compensation is 25.000 - 34.000.
We aim to respond to suitable candidates as soon as possible.
Full responsibilities and requirements are described in the listing above.
Learn more about the Photomask Wet Process Intern:
Data-Driven Cleaning role in the description above.
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