Intern: AI-Driven OPC/RET Mask Tech
Listed on 2026-10-07
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Software Development
AI Engineer (Applied/Software)
Micron Technology, Inc, in Idaho, invites interns to join the Advanced Mask Development Group to explore Optical Proximity Correction (OPC) and Resolution Enhancement Techniques (RET) through hands-on projects. You will work with experienced RET engineers, develop AI-driven workflows, and contribute to reticle design optimization leveraging scripts and programming to broaden process windows.
The program targets students pursuing BS, MS, or PhD in Engineering or Science, with strong analytical
As a Intern: AI-Driven OPC/RET Mask Tech, you will play an important part at Micron Technology, Inc in Boise, , United States.
The advertised compensation is 28.000 - 41.000.
We aim to respond to suitable candidates as soon as possible.
Full responsibilities and requirements are described in the listing above.
Learn more about the Intern: AI-Driven OPC/RET Mask Tech role in the description above.
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