Research Engineer; Atomic Layer Etching​/2D Materials

Research Engineer (Atomic Layer Etching / 2D Materials)

We are seeking a motivated and detail-oriented Research Engineer to support a research project focused on atomic layer etching (ALE) techniques. The goal of the project is to develop highly selective and anisotropic etching processes for silicon, 2D, and dielectric materials, essential for next-generation semiconductor device fabrication.

• Assist in the development and refinement of ALE process recipes for silicon and various dielectric layers.
• Operate etching equipment and perform routine process monitoring.
• Conduct surface characterization using tools such as ellipsometry, XPS, AFM, and SEM.
• Collaborate with engineers, researchers, and cleanroom staff to support experimental tasks.

• Bachelor’s degree in Electrical Engineering, Materials Science, Physics, Chemical Engineering, or a related field.
• Some experience or coursework in semiconductor fabrication, vacuum/plasma systems, or thin film processing is an advantage.
• Willingness to work in a cleanroom and learn hands‑on tool operation.
• Strong attention to detail and good organizational skills.
• Ability to work both independently and in a team setting.

• Prior exposure to ALD/ALE, plasma etching, or other dry etch techniques.
• Familiarity with tools such as Oxford Instruments, Lam Research, or Plasma‑Therm systems.
• Open to Fixed Term Contract.

Kent Ridge Campus

College of Design and Engineering

Department:
Electrical and Computer Engineering

Employee Referral Eligible:
No

Job requisition