Senior Scientist - EUV Research

ASML US, LP brings together the most creative minds in science and technology to develop lithography machines that are key to producing faster, cheaper, more energy-efficient microchips. We design, develop, integrate, market and service these advanced machines, which enable our customers - the world’s leading chipmakers - to reduce the size and increase the functionality of their microchips, which in turn leads to smaller, more powerful consumer electronics.

Our headquarters are in Veldhoven, the Netherlands, and we have 18 office locations around the United States including main offices in Wilton, CT, Chandler, AZ, San Jose, CA and San Diego, CA.

We have an exciting opportunity for a Senior Scientist – EUV Research to join a dynamic and innovative Technology Development team, focused on conceiving and demonstrating the technologies required for next generations of high-power extreme ultraviolet (EUV) light sources. Based on a laser produced plasma (LPP), our light source relies on a wide range of unique and challenging technologies, ranging from laser light amplification and high-power optical systems to laser produced plasma for EUV generation, electro-optical signal detection and algorithm-based actuation for process control.

You are invited to bring your passion, knowledge and expertise in areas of applied physics, plasmas, metrology, optics, controls, lasers, and experiment design to push the boundaries of these technologies forward.

A key ingredient in the EUV generation process is a stable source of molten tin droplets. These droplets provide the fuel for the laser-produced plasma and serve as the heart-beat for synchronizing the EUV source. The challenge is to reliably produce nearly perfect droplets of molten tin at a rate of tens of thousands of times per second with speeds of 10’s of m/s and position stability within a fraction of a droplet diameter.

If these dimensions were scaled up to the game of golf, this would be equivalent to continuously scoring hole-in-ones in a hole that’s 25 km away in swirling gas flows and a plasma that’s hotter than the surface of the sun. The successful candidate will be comfortable operating in this diverse mix of physics, materials science and engineering, in order to define the droplet generator architecture for next generations of the EUV source.

The successful candidate will also have a passion for innovation, be driven by curiosity, and have deep technical understanding, in order to excel in a Research environment operating at the fuzzy front end of product development. A key ingredient for success in this space is the ability to transform a complicated multi-physics environment into a sequence of more easily digestible phenomena.

The successful candidate will be given the opportunity to carry forward the innovations all the way from feasibility studies to hardware development and implementation by bridging the gap between modelling and experiments. The successful candidate will work in a team environment and will also get the opportunity to lead small x-competence team members towards the completion of planned research goals.

• - Guide development of high-level architecture used for the generation of droplets in the EUV source.
• - Lead the design of droplet generation hardware and build the needed metrology + testing capabilities to demonstrate the droplet performance up to 1000’s of Kbar.
• - Provide input to technology roadmaps and identify key scientific learning objectives and define corresponding experimental design to arrive at design guidelines, performance requirements and procedures to product teams.
• - Identification of key scientific learning objectives and corresponding experimental design…