Resist and stochastics researcher

Introduction to the job

Are you interested in working at the cutting edge of technology and shaping the future of ASML? Do you have the technical capabilities to provide innovative solutions? Does contributing to the world’s most advanced lithography machines make you feel excited? Then, this position might be the right opportunity for you.

Within ASML, the Research department supports the long‑term roadmap by exploring novel concepts and developing new competences relevant to semiconductor manufacturing.

The mission of the Resist and Stochastics Researcher is to conduct research supporting ASML’s computational metrology and patterning products, with focus on future applications in the semiconductor industry. This involves preparation of exposure designs of experiments, analyzing wafer data after exposure, developing resist and process models, performing literature studies, and creating innovative concepts and solutions.

A key aspect of the job is to experimentally test lithography performance in terms of stochastics, and to develop a quantitative description of how lithography exposure conditions & resist material properties influence stochastic pattern variability such as line‑width roughness and stochastic defects such as microbridges. This includes a rigorous description of the exposure process, photoionization, photochemical reactions, photoresist development, and typical wafer metrology techniques such as CD‑SEM, AFM & XS‑TEM.

Your responsibilities and daily activities will be:

• Preparing test plans to generate experimental data for model calibration, and subsequent data analysis
• Developing computational models for processing steps, such as resist exposure, etch, and deposition
• Collaborating with other lithography & resist specialists in the project team and with other departments of ASML (e.g. working on resist & wafer processing or wafer metrology), with engineers from photoresist vendors in JDPs and with customer path‑finding process engineers at R&D fabs
• Generating new ideas and solutions for ASML’s current and future metrology and patterning products

Ideally, you hold a technical university PhD in physics, chemistry, material science or applied mathematics with extensive experience in lithography and/or resist photochemistry.

• You possess a good experience in computational model development and calibration
• You have a proven background in extracting simplified, yet reasonably accurate model representations from complex physical and/or chemical processes/reactions
• You’re preferably experienced in cleanroom fabrication techniques or semiconductor manufacturing processing steps

Working at the cutting edge of technology, you’ll always have new challenges and new problems to solve – and working together is the only way to do that. You won’t work in a silo. Instead, you’ll be part of a creative, dynamic work environment where you’ll collaborate with supportive colleagues. There’s always space for creative and unique points of view. You’ll have the flexibility and trust to choose how best to tackle tasks and solve problems.

To thrive in this job, you’ll need the following skills:

• Ability to cooperate within a highly skilled team of experts towards a common goal
• Self‑supporting skills and enthusiasm
• Inquisitive personality with an analytical view
• Commitment and motivation to achieve project outcomes
• Ability to see and develop the bigger picture
• Ability to communicate effectively in English across disciplines and at all organizational levels.

Within ASML, the sector Research is responsible for creating ideas and solutions that contribute to the ASML roadmaps. The group “Resist and Process Technology” is responsible for innovations and knowledge generation in computational lithography. The group takes a holistic view of semiconductor patterning, where optimizing all processing steps together can yield more than optimizing each processing step independently. We work in small teams and deliver proof‑of‑concept solutions that can be transferred to Development & Engineering.

We intensively collaborate with external research…