Postdoctoral Fellow​/Process Engineer metal assisted chemical etching

100%, Zurich, fixed-term

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The X-ray Imaging Professorship is dedicated to advancing the clinical translation of grating-based X-ray interferometry in close collaboration with industrial partners. This groundbreaking technology relies on the development of state-of-the-art X-ray optics enabled by cutting-edge micro- and nanofabrication techniques.

To support this effort, we are seeking a highly motivated Postdoctoral Researcher or Process Engineer to join the SNSF-funded project ABSOLUTE
, working under the supervision of our micro- and nanofabrication specialist, Dr. Lucia Romano, at the Paul Scherrer Institute. As part of a multidisciplinary team of academic and industrial researchers, you will contribute to the development and optimisation of next-generation fabrication technologies with direct relevance to advanced X-ray imaging applications.

The SNSF-funded project ABSOLUTE (nAnoassemBled catalySt and electrOchemicaL processing for hUge aspecTratio microstructurEs) focuses on developing an innovative catalyst concept for defect control in metal-assisted chemical etching (Mac Etch) of silicon. The project aims to overcome key challenges in the fabrication of high-aspect-ratio microstructures by improving process reliability, scalability, and manufacturing quality.

In this role, your primary responsibility will be to expand and enhance our Mac Etch testing capabilities across a broad range of feature sizes and aspect ratios. You will investigate defect formation mechanisms, optimise process parameters, assess scalability, and contribute to the development of robust fabrication processes that enable the production of complex silicon microstructures for future X-ray optical components.

• Integration, qualification, and performance assessment of an advanced and unconventional microfabrication process
• Systematic optimisation of fabrication parameters to improve process robustness, reproducibility, and scalability
• Characterisation of high-aspect-ratio etched microstructures, including the development of dedicated metrology and defect‑analysis methodologies

• Fabricate and process samples on 4-inch silicon wafers using UV photolithography, thin‑film deposition, thermal treatments, and metal‑assisted chemical etching (Mac Etch)
• Perform structural and dimensional characterisation using optical microscopy, scanning electron microscopy (SEM), and profilometry
• Document fabrication procedures, process results, and experimental findings in a structured and traceable manner
• Analyse data, prepare technical reports, and contribute to project deliverables
• Present research outcomes at international conferences, scientific symposia, and internal workshops
• Disseminate results through high-impact scientific publications and collaborative research activities

We are seeking a highly motivated professional with a strong collaborative mindset, a hands‑on approach to problem solving, and a demonstrated ability to deliver results in a dynamic research environment.

• PhD in Physics, Chemistry, Materials Science, Engineering, or a closely related discipline
• Proven experience working in semiconductor cleanroom environments, with a solid understanding of semiconductor processing and hands‑on expertise in photolithography and scanning electron microscopy (SEM)
• Experience in silicon etching and MEMS fabrication is highly desirable. Previous involvement in translational research at the interface between academia and industry would be a distinct advantage
• Strong analytical and problem‑solving skills, combined with a practical, hands‑on attitude and the ability to work effectively within multidisciplinary teams
• Ability to manage priorities and perform efficiently in a project‑driven environment with demanding timelines
• Willingness to travel within Europe (up to 20% of working time)
• Excellent written and verbal communication skills in English

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