Understanding Pattern Loading Materials in Nanoconfined Etching
Listed on 2026-07-16
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Research/Development
Location: Town of Belgium
Understanding Pattern Loading Across Materials in Nanoconfined Etching
Master internship – Leuven – more than two weeks ago
Disentangling geometry‑driven and material‑driven effects in pattern loading is essential for the continued scaling of microelectronic devices. The project will systematically investigate etching behavior in nanoconfined structures across different material systems (oxides, metals, and nitrides) and identify the roles of material‑dependent etching kinetics and surface properties such as wall charge. Successful results are expected to lead to publication in a peer‑reviewed journal.
Key responsibilities:
- Study how material‑dependent etching kinetics influence confinement effects and pattern loading.
- Investigate the role of surface properties, such as wall charge, on etching behavior in nanoconfined structures.
- Use advanced characterization techniques, including SEM, TEM, solid‑surface zeta‑potential, and ellipsometry.
Candidate profile:
- Master’s student in chemistry, chemical engineering, material science or a related field.
- Prior experience working in a chemical laboratory.
Type of internship:
Master internship
Required educational background:
Chemistry/Chemical Engineering
Supervisor:
Alina Arslanova ()
Reference code: 2026-INT-182
Applications should include resume, motivation, and current study.
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