Sr. Manager, Dry Etch ME; Manufacturing Engineering
Listed on 2026-06-28
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Engineering
Manufacturing Engineer, Process Engineer, Lean Manufacturing / Six Sigma
Req
Sr. Manager, Dry Etch ME (Manufacturing Engineering)
Micron Technology is a world leader in innovating memory and storage solutions that accelerate the transformation of information into intelligence, inspiring the world to learn, communicate and advance faster than ever.
The Manufacturing Engineering organization at Micron’s Idaho F4 High Volume Manufacturing (HVM) site is responsible for enabling world‑class manufacturing performance as ID1, the newest memory fab in the United States, ramps to scale. The team partners closely with global manufacturing sites, technology development, and central engineering organizations to deliver safe, high‑quality, and cost‑effective operations.
Responsibilities- Formulate the strategic vision for your department and manage resources to support it. Concentrate on Dry Etch process capability, tool performance, and fleet scalability.
- Drive fab optimization by improving output and yield while reducing operational costs and maintaining outstanding quality standards.
- Lead Dry Etch process and equipment improvement efforts, including optimization of RF power delivery, gas chemistries, and endpoint detection systems.
- Work together with Technology Development, Process & Equipment Engineering, Facilities, and the worldwide manufacturing network to guarantee alignment with Micron's business plans and strategic objectives.
- Employ advanced analytics and AI/ML‑powered solutions to elevate manufacturing performance, incorporating Fault Detection & Classification (FDC) and predictive maintenance for etch tools.
- Proven track record of leading teams toward common goals within semiconductor manufacturing, with strong preference for Dry Etch or plasma processing experience.
- Strong knowledge of manufacturing team structure, standards, and processes, including equipment engineering and process control in high‑volume fabs.
- Proven ability in leading teams and solving complex problems, particularly in etch process variability, defectivity, and tool performance.
- Outstanding data analysis, problem‑solving, and troubleshooting skills, with experience analyzing process trends, tool signals, and yield data.
- Bachelor’s degree or higher in Electrical Engineering, Chemical Engineering, Materials Science, Physics, or related field, with previous leadership experience and a minimum of 5 years direct semiconductor experience.
- Direct experience in Dry Etch manufacturing, including plasma etch systems, chamber tuning methods, and process improvement.
- Proven ability to lead multiple complex projects simultaneously, including technology ramps and process transfers.
- Strong organizational and prioritization skills in managing a large fleet of etch tools and competing production demands.
- Outstanding communication skills to effectively present highly technical Dry Etch concepts and collaborate across engineering and operations teams.
- Experience coaching and mentoring team members to support their career development and build next‑generation Dry Etch technical leadership.
- Experience and/or interest in developing Agentic AI workflows into current or future processes.
Micron offers a choice of medical, dental and vision plans in all locations enabling team members to select the plans that best meet their family healthcare needs and budget. Micron also provides benefit programs that help protect income if unable to work due to illness or injury, and paid family leave. Additionally, Micron benefits include a robust paid time‑off program and paid holidays.
Micron is proud to be an equal opportunity workplace and is an affirmative action employer. All qualified applicants will receive consideration for employment without regard to race, color, religion, sex, sexual orientation, age, national origin, citizenship status, disability, protected veteran status, gender identity or any other factor protected by applicable federal, state, or local laws.
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