Process Engineer, Photomask Inspection Boise, Idaho, Posted

## Process Engineer, Photomask Inspection Boise, Idaho, United States of America Apply Now Find out how well you match with this jobJob IDJR
108044
** Our vision is to transform how the world uses information to enrich life for
* all*.
** Micron Technology is a world leader in innovating memory and storage solutions that accelerate the transformation of information into intelligence, inspiring the world to learn, communicate and advance faster than ever.

As a
** Photomask Inspection Engineer / Process Engineer
** at Micron Technology Center (MTC), you will be responsible for starting up, developing, optimizing, and sustaining reticle inspection and inspection-related processes to ensure the highest levels of product quality, reliability, yield, cost efficiency, and risk management. This role focuses on EUV reticle pattern inspection, Automatic Defect Classification (ADC), defect avoidance, continuous improvement, and advanced data analysis in support of Micron’s reticle and lithography roadmaps.##

## ## Responsibilities
* Start up, develop, optimize, and sustain photomask inspection processes including reticle pattern inspection, EUV inspection, ADC, defect avoidance, and inspection sensitivity tuning to ensure zero printing defects and shipment errors
* Identify, diagnose, and resolve process-related manufacturing issues using systematic problem-solving methodologies such as Failure Analysis, FMEA, 8D, MBPS, RCA, SPC/FDC, and statistical data analysis
* Lead and participate in continuous yield improvement, cost reduction, productivity improvement, automation, and efficiency initiatives to improve KPIs such as First Time Success Rate, nuisance/false alarm reduction, equipment availability, and RPT
* Monitor tool health, SPC performance, inspection results, and respond to trends or out-of-spec (OOS) process and equipment conditions
* Research, develop, implement, and qualify new inspection processes, techniques, sensitivities, models, and baselines to support Micron’s reticle, EUV, pellicle, and High-NA lithography roadmaps
* Collaborate closely with R&D, FEOL, HVM, sustaining engineering, manufacturing, and inspection process/equipment engineering teams to support defect analysis, printability assessment (including Actinic images and WPC), and data-driven decision making
* Engage with inspection tool, software, equipment, and material suppliers to evaluate, qualify, audit, and improve current and next-generation capital equipment, ADC algorithms, materials, and inspection capabilities while meeting quality, cost, ROI, and risk objectives
* Provide technical leadership by mentoring and training manufacturing personnel and engineers. Offer authoritative insight into tool and process capabilities and appropriate data collection techniques. Use AI tools to improve efficiency.## ## ##

Minimum Qualifications
* Bachelor’s degree or higher in Engineering, Physics, Optics, or Mathematics
* Minimum of 2+ years of experience in reticle pattern inspection or wafer inspection (RDA)
* Experience optimizing inspection sensitivities to ensure defect detection and zero printing defects
* Experience developing, tuning, and optimizing ADC (Automatic Defect Classification) systems and algorithms
* Strong competency in systematic problem-solving techniques (e.g., MBPS, RCA) with excellent written and verbal communication skills and ability to work with limited guidance## ## ##

Preferred Qualifications
* EUV reticle inspection experience
* Experience qualifying new capital equipment and next-generation inspection tools
* Experience applying AI or advanced analytics to improve inspection efficiency and effectiveness

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