Internship - Gas Flow Control

At VAT, we change the world with vacuum solutions. As the world’s leading supplier of high-performance vacuum valves, we have been driving innovation for more than 60 years. With over 3,200 employees worldwide, we operate from our headquarters in Haag, Switzerland, with manufacturing sites in Switzerland, Malaysia and Romania, as well as sales and service hubs around the world. We guided by our passions integrity, teamwork, customer centricity, and innovation – always working together as #oneVAT.

Joining us means becoming part of a passionate, international team where your voice is heard, your ideas matter, and your career growth is supported.

We at VAT Group AG, headquartered in Switzerland, invite a both talented and passionate Internship candidate to join our Corporate R&D BU - one of our most valued Business Units.
The manufacturing of a high-end microchip requires over 1000 production steps. Vacuum valves and gas flow control devices are critical components as they are in proximity to the semiconductor wafer and impact the process performance. Semiconductor fabs like Intel, Samsung or TSMC have increasing expectations for productivity and production yield. Technological advancements in the semiconductor industry and scaling to nano-meter structures require a high precision control of process gases during production.
You will collaborate with Lab Development Engineers on lab initiatives, with the opportunity to manage your own projects and tasks independently .

WHAT WE OFFER

Join a global leader at the forefront of semiconductor innovation, we are a globally leading company in the semiconductor industry

A technologically advanced and innovative working environment with Modern Laboratory and testing facilities

Thrive in a collaborative, innovative environment that celebrates bold — where your potential knows no bounds

Enjoy an exceptional working environment with great amenities at our VAT Group offices in the Swiss canton of St. Gallen

Receive competitive and benefits aligned with your expertise and contributions

YOUR CHALLENGES

• Contribute to the development of high-performance vacuum valves and gas flow control devices critical for semiconductor wafer processing.
• Support semiconductor fabs (e.g., Intel, Samsung, TSMC) in meeting increasing productivity and yield expectations.
• Analyze and leverage manufacturing process data to enhance production performance.
• Help design smart, connected vacuum components enabling predictive maintenance and improved performance in semiconductor fabs.
• Tackle challenges in precise control of process gases for nano-scale semiconductor production.
• Apply principles of fluid dynamics, control theory, and modeling to advance semiconductor manufacturing technology.

In addition your responsibilities are

• Data analysis, system modeling and simulation for gas flow control systems in vacuum applications
• Development of advanced control algorithms for precise gas injection using VAT’s existing gas delivery technology
• Characterization and verification test of the developed flow control technology in the lab
• Develop, perform and document experiments (DoE) including results in organized and structured way
• Cooperate among cross-functional teams of experts within VAT R&D organization and external technology partners

YOUR COMPETENCIES

• Engineering Degree (BSc or MSc) in control engineering, mechatronics, mechanical engineering, physics or similar
• Knowledge in fluid dynamics, control system theory and system modeling is required
• Programming skills in Matlab & Simulink or Python is required, structured text and C++ programming skills are advantageous
• Practical experience with deploying control systems on embedded hardware is a plus
• Knowhow in fluid dynamics and thermodynamics for vacuum applications is advantageous
• Hands on, systematic approach, creative thinker with problem solving skills and team spirit

Interested? We look forward to receive your application.

You can expect a dynamic and successful company where innovation, courage, fairness and transparency are encouraged and your ideas are welcome.