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Research Associate Physics

Job in New York, New York County, New York, 10261, USA
Listing for: Brookhaven National Laboratory
Full Time position
Listed on 2026-09-20
Job specializations:
  • Research/Development
    Research Scientist
Salary/Wage Range or Industry Benchmark: 74000 - 123000 USD Yearly USD 74000.00 123000.00 YEAR
Job Description & How to Apply Below
Location: New York

## Research Associate Physics Apply:
Upton, NY:
Full time:
Posted Yesterday:
JR102693

Brookhaven National Laboratory (BNL) is entering an exciting new chapter with one of the newest and most advanced synchrotron facilities in the world. National Synchrotron Light Source II (NSLS-II) enables the study of material properties and functions with nanoscale resolution and exquisite sensitivity by providing world-leading capabilities for X-ray imaging and high-resolution energy analysis. This facility is open to users from academia and industry, and its operations are at a time when the world enters a new era with a global economy fueled largely by scientific discoveries and technological innovations.

NSLS-II provides the research tools needed to foster new discoveries and create breakthroughs in critical areas such as energy security, environment, and human health.
** Position Description
** The Optics Group at the National Synchrotron Light Source II (NSLS-II) is seeking a Research Associate specializing in optical metrology for X-ray mirrors. The selected candidate will advance precision measurement and characterization of ultra-precision X-ray optics using the Optical Coordinate Measuring Machine (OCMM) platform. Working within the P3N (Pioneering Nanometrology and Nanofabrication for Next-Generation X-ray Mirrors) program, you will establish measurement workflows, validate metrology techniques, and contribute directly to enabling next-generation synchrotron capabilities.

The OCMM is a key measurement platform for deterministic fabrication of high-curvature and freeform X-ray mirrors. You will develop and validate a documented, repeatable OCMM workflow capable of single-nanometer-level surface-height measurements. Your work will integrate baseline hardware characterization, reconstruction algorithm conditioning, software workflow development, and mirror validation against established BNL reference metrology methods. You will diagnose error sources, optimize measurement geometry, preserve data traceability, and produce analysis outputs suitable for fabrication feedback and comparison with reference techniques such as the Nano-accuracy Surface Profiler (NSP), Fizeau Stitching Interferometry (FSI), and Coherent Scanning Interferometry (CSI).
*
* Essential Duties and Responsibilities:

*** Establish and document the OCMM baseline, including hardware configuration, sensor and stage behavior, calibration records, and reproducible operating procedures.
* Perform controlled experiments to characterize and separate sensor noise, mounting compliance, mechanical drift, thermal effects, and reconstruction-induced errors.
* Diagnose sensor range limitations and data dropouts, then develop protocols to flag invalid or marginal measurements and evaluate their impact on reconstructed profiles.
* Improve the robustness of the OCMM surface-reconstruction method using singular value decomposition to identify and characterize poorly constrained measurement modes.
* Screen and optimize candidate measurement geometries through analytical analysis and experimental validation.
* Develop and integrate validated scan and reconstruction strategies into acquisition and analysis software.
* Implement quality checks and automated diagnostics to detect anomalous inputs, missing samples, range violations, inconsistent geometries, and configuration mismatches.
* Validate the controlled OCMM workflow using progressively more demanding X-ray mirror reference surfaces.
* Compare OCMM measurements with high-quality reference data from NSP, FSI, CSI, and other BNL metrology methods, document registration, filtering, aperture, and quantitative agreement or discrepancies.
* Provide root-cause analysis when hardware limits prevent reliable measurement of demanding mirrors and identify mitigation strategies or system upgrades.
* Publish results in peer-reviewed journal articles.
* Present research work and results to management and scientific conferences.
* Demonstrated commitment to working safely, acting ethically, and taking personal accountability for operational excellence.
** Required Knowledge, Skills, and Abilities:
*** Ph.D. degree in Physics, Optical Engineering, Mathematics, Mechanical Engineering, or related discipline.
* Strong knowledge of optical metrology and precision measurement techniques.
* Demonstrated experience with optical instruments and characterization methods (e.g., interferometry, microscopy, phase measurement).
* Proven skill in sensor integration, data…
Position Requirements
10+ Years work experience
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