Sr Engineer R&D Source Mask Optimization

Job Opportunity:
Source-Mask Optimization R&D Engineer

Location:

San Jose, United States

ASML US is a leading lithography equipment manufacturer. This role focuses on photolithography scanner optimization through modeling, machine learning, and software development.

• Model complex optical phenomena in ASML photolithography scanners to enable semiconductor device shrinkage.
• Optimize scanner configuration and photomask layout to improve resolution enhancement and match imaging performance across a fleet of scanners.
• Collaborate on future scanner design and assist in selecting light sources, lenses, mirrors, dose, and focus settings.
• Develop large-scale C++ and Python software tools that co‑optimize optical and mask parameters.

• Strong understanding of optical physics and photoresist chemistry.
• Experience with modern optimization and machine learning algorithms.
• Proficient in C++ and Python software design and development.
• Ability to work in a cross‑functional R&D team.

ASML US is an Equal Opportunity Employer. All qualified applicants will receive consideration for employment regardless of race, color, religion, sex, gender identity, sexual orientation, national origin, age, disability status, or any other protected characteristic.