Summer - Computational Lithography​/Patterning Intern

Summer 2024 - Computational Lithography/Patterning Intern(5322)

We are looking for research engineers for next generation of computational technologies for Nano patterning. Lithography patterning is one of the key processes of the most advanced semiconductor manufacturing. You will participate in it by developing advanced numerical algorithms and software architectures and deploying them on leading computational hardware in order to support our scientific and engineering objectives. The ideal candidate would be research engineers who are familiar with lithography/etching simulation, seek for new idea from conference/papers, and have a strong will to bring your new ideas to production.

• Works in R&D group to develop leading edge software for Nano patterning which involves e-beam, lithography, resist and etching process modeling.
• Seek new resolution enhancement techniques for low-k1 lithography patterning.
• Develop and maintain in-house lithography and etching simulation software.
• Analyze simulation/experimental data and summarize background scientific theories to propose theoretical or empirical solutions.
• Work closely with Taiwan headquarters.

• Currently pursuing a PhD degree in physics, mathematics, electrical engineering, or computer science.
• Excellent programming skills in a high-level language such as C, C++, Fortran, or Python.
• Familiarity with high-throughput calculations, database building and machine learning techniques.
• Knowledge in optics or electromagnetism is a must.

• Efficiency in addressing and learning new topics and strong technical problem-solving and analytical skills.
• Self-driven and capable of focused, innovative, analytical work.
• Effective written and verbal communication skills.