Postdoctoral Appointee -Fabrication Photonic and Quantum Devices

The Center for Nanoscale Materials (CNM) and the Materials Science Division (MSD) at Argonne National Laboratory are jointly seeking a highly motivated postdoctoral researcher to advance quantum photonic platforms through nano- and meso-scale lithographic fabrication. This position supports two complementary, three-year LDRD projects focused on hybrid quantum transduction and terahertz photon generation via enhanced light‑matter interactions. The postdoc will lead efforts in device patterning and the integration of complex materials—ferroelectrics, plasmonics, semiconductors—into photonic and THz architectures.

• Develop and optimize lithographic patterning of nano- and meso-scale structures, such as gratings, wave guides, cavities, and metamaterials for quantum and THz devices.
• Integrate ferroelectric and other functional materials into photonic architectures for electro‑optic and quantum transduction applications.
• Perform full device processing using cleanroom techniques, including electron‑beam lithography, dry/wet etching, and metallization.
• Collaborate within a multidisciplinary team across CNM, MSD, APS, and Q‑NEXT to characterize device performance across structural, optical, electro‑optic, and cryogenic environments.
• Participate in synchrotron‑based characterization and data analysis.
• Contribute to high‑impact publications, internal reports, and scientific presentations at conferences and workshops.

• Ph.D. in Materials Science, Physics, Electrical Engineering, Applied Physics, or a related field (completed or soon‑to‑be completed).
• Demonstrated expertise in nano‑ and mesoscale fabrication, including mask design, metal sputtering, laser or e‑beam lithography, etching, and device integration.
• Familiarity with thin‑film materials (e.g., oxides, dielectrics, metals) and their integration into photonic or electronic systems.
• Hands‑on experience with SEM, AFM, TEM, and other characterization tools.
• Demonstrated ability to work independently and collaboratively in a multidisciplinary environment.
• Strong written and oral communication skills.
• Ability to model Argonne’s core values of impact, safety, respect, integrity, and teamwork.

• Experience with block copolymer patterning and pattern transfer techniques.
• Background in fabrication or simulation of photonic or THz devices (gratings, dielectric wave guides, ring resonators, modulators).
• Hands‑on experience in epitaxial thin‑film growth and characterization (oxides preferred) using sputtering, PLD, or MBE.
• Familiarity with synchrotron‑based X‑ray techniques and electron microscopy.
• Knowledge of quantum devices, nonlinear optics, or microwave photonics.
• Working knowledge of simulation tools such as COMSOL or Lumerical for electro‑optic modeling.

• Proficiency in Python‑based data analysis or image processing.
• Experience with AI‑assisted or feedback‑driven fabrication workflows.
• Interest in quantum photonic platforms, electro‑optic systems, or light‑matter coupling physics.

• Curriculum Vitae (CV)
• Cover letter describing research experience and fit for the role
• Contact information for three references

The expected hiring range for this position is $70,758.00–$. The pay offered to a selected candidate will be determined based on factors such as the scope and responsibilities of the position, the qualifications of the selected candidate, business considerations, internal equity, and external market pay for comparable jobs. Comprehensive benefits are part of the total rewards package.

Argonne National Laboratory is an equal‑employment‑opportunity employer. We are committed to a safe and welcoming workplace that fosters collaborative scientific discovery and innovation. Argonne encourages everyone to apply for employment. Argonne is committed to nondiscrimination and considers all qualified applicants for employment without regard to any characteristic protected by law. All Argonne offers of employment are contingent upon a background check.

Certain positions require federal security clearance. Failure to obtain or maintain clearance could result in the withdrawal of a job offer or future termination of employment.